Specific Process Knowledge/Etch/ICP Metal Etcher/Examples of End point detection

From LabAdviser

Feedback to this page: click here
Unless otherwise stated, this page is written by DTU Nanolab internal

Cr etch with end point on SiO2

Done April 2023 by bghe

The above images shows a view from Spectral View during etching Cr with DUV resist as masking material of a 6" wafer with more than to 50% open area.