October 2010 Survey

Survey introduction

The October 2010 survey was the third survey carried out using a format where individual cleanroom users were asked about their view on various parts of using DTU Danchip's facilities and in particular the cleanroom facilities.
The questionaire was send to 169 registered users (based on the logging of cleanroom use) unfortunately 2 of the e-mail adresses was obsolete and thus the mails bounced, which brought the total number of potential answers to 167 . In total 24 persons answered the questionaire which means an answer fraction of 14% regardless of whether or not the bounces should be included in the total.
This page deals with the comments given as part of the questionaire. Danchip values this feedback highly.

Comments

The comments appear here as they were written in the feedback field of the questionaire. In a few cases they have been anonymized or the worst spelling mistakes corrected.

Comment 1

For some tools you are extremely specific with rules to follow, but for others you allow highly contaminating processes - like e.g. the SSE spinner where you allow think resists that contaminates a system that is intended to be used for nanolithography (e-beam and nanoimprint).

Action:

Comment 2

For some tools you are extremely specific with rules to follow, but for others you allow highly contaminating processes - like e.g. the SSE spinner where you allow think resists that contaminates a system that is intended to be used for nanolithography (e-beam and nanoimprint).

Action: