Equipment
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Nova
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QFEG
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AFEG
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Helios
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Purpose
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- Conductive samples in High Vac
- Charge reduction in Low Vac
- X Ray Analysis with EDS
- Crystallographic analysis using EBSD and both On and Off axis TKD
- In-situ experiments with Heating and Gas injection
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- Conductive samples in High Vac
- Charge reduction in Low Vac
- Environmental control using Peltier stage
- Cryogenic sample fixing/stabilization using cryo stage
- X Ray Analysis with EDS
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- Conductive samples in High Vac
- Charge reduction in Low Vac
- X Ray Analysis with EDS and WDS
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- Conductive samples in High Vac
- Micro and Nano milling/fabrication using various gases and FIB
- X Ray Analysis with EDS
- Crystallographic analysis using EBSD and Off Axis TKD
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Equipment position
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Building 314 Room 060
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Building 314 Room 011
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Building 314 Room 034
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Building 314 Room 061
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Resolution
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The resolution of a SEM is strongly dependent on sample type and the operator. Resolution quoted is using sputtered gold on carbon
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- High Vacuum operation in Mode II:
- 1.0 nm at 15 kV (TLD detector and optimum working distance)
- 1.8 nm at 1 kV (TLD detector and optimum working distance)
- Low Vacuum operation in Mode II:
- 1.5 nm at 10 kV (Helix detector and optimum working distance)
- 1.8 nm at 3 kV (Helix detector and optimum working distance)
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- High vacuum
- 0.8 nm at 30 kV (STEM)
- 1.0 nm at 30 kV (SE)
- 2.5 nm at 30 kV (BSE) - 3.0 nm at 1 kV (SE)
- High vacuum with beam deceleration option
- 3.0 nm at 1 kV (BD mode + BSE)
- Low vacuum - 1.4 nm at 30 kV (SE)
- 2.5 nm at 30 kV (BSE)
- 3.0 nm at 3 kV (SE)
- Extended vacuum mode (ESEM)
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- High vacuum
- 0.8 nm at 30 kV (STEM)
- 1.0 nm at 30 kV (SE)
- 2.5 nm at 30 kV (BSE) - 3.0 nm at 1 kV (SE)
- High vacuum with beam deceleration option
- 3.0 nm at 1 kV (BD mode + BSE)
- Low vacuum - 1.4 nm at 30 kV (SE)
- 2.5 nm at 30 kV (BSE)
- 3.0 nm at 3 kV (SE)
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- Electron Column Operation in Mode II
- Ion Column
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Detectors
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- ETD/TLD Secondary Electrons
- BSED Back Scatter Electrons
- LVD/LFD Low Vac SE
- Helix Low Vac SE
- EDS X Ray by energy
- EBSD Electron Back Scatter Diffraction
- TKD Transmission Kikuchi Diffraction
- STEM Scanning Transmission Electron Microscopy
- GAD Low Vac BSED
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- ETD Secondary Electrons
- BSED Back Scatter Electrons
- LVD/LFD Low Vac SE
- GSED ESEM SE
- EDS X Ray by energy
- STEM Scanning Transmission Electron Microscopy
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- ETD Secondary Electrons
- BSED Back Scatter Electrons
- LVD/LFD Low Vac SE
- GSED ESEM SE
- EDS X Ray by energy
- STEM Scanning Transmission Electron Microscopy
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- ETD/TLD Secondary Electrons
- ABS Annular BSED
- EDS X Ray by energy
- EBSD Electron Back Scatter Diffraction
- CDEM Continuos Dinode Electron Multiplier
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Stage specifications
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- X 150mm Piezo
- Y 150mm Piezo
- Z 10mm
- R 360⁰ Piezo
- T 70⁰
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- X 50mm
- Y 50mm
- Z 50mm
- R 360⁰
- T 70⁰ Manual
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- X 50mm
- Y 50mm
- Z 50mm
- R 360⁰
- T 70⁰ Manual
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- X 150mm Piezo
- Y 150mm Piezo
- Z 10mm
- R 360⁰ Piezo
- T 70⁰
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Options
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B
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C
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D
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E
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Max sample size
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Consult with DTU Nanolab staff as weight, dimensions, pumping capacity and technique all play a roll in the sample size
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