Specific Process Knowledge/Lithography/4562
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AZ 4562 is a positive UV photoresist for thick coatings (5µm and above).
Priming
Spin coating
Exposure
Development
The recommended development speed for AZ 4562 is 2µm/min. A 6.2µm resist film thus requires 3min development, usually as three 60s puddles of TMAH (AZ 726 MIF). 10µm AZ 4562 has successfully been developed using 4x60s development