Specific Process Knowledge/Thin film deposition/Deposition of Gold/Roughness of Au

Uniformity of Au layers

Au

Experimental

Au was deposited directly on unprocessed Si wafers, and the deposited layers were therafter examined with AFM.

The deposition parameters were changed, and different equipment was used. Below AFM pictures of layers deposited in different ways can be seen.

Results

The surface is uniform, without any larger structures. Below a 2.5 x 2.5 mym large area of the surface is shown, the difference in highest between the lowest and tallest structure is about 7nm.

E-beam deposited Au layer; deposited in the Wordentec, rate 5 Å/s. The Au surface is uniform, without any large variations of the surface structure.