Specific Process Knowledge/Thin film deposition/DiamondCVD
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SEKI Diamond CVD
The user manual(s), user APV(s), technical information, and contact information can be found in LabManager:
Process information
Software for analysis
Equipment | SEKI AX5250S | |
---|---|---|
Purpose | Diamond growth |
|
Parameters |
H2 |
1000 sccm |
CH4 |
50 sccm | |
O2 |
20 sccm | |
Operating pressure |
>200 Torr | |
Power |
5000 W | |
Temperature |
700-900 °C | |
Substrates | Substrate size |
up to 100 mm wafers, 50 mm prefered |
Allowed materials |
Ask |