Specific Process Knowledge/Thin film deposition/ALD Picosun R200/AZO deposition using ALD
AZO page
AZO can be deposited in a temperature window 150 - 250 oC. Physical and optical properties are strongly corelated with deposition temperture and Al doping concentration. All results shown on this page have been obtained using the Si(100) wafers with native oxide as substrates:
Al-doped ZnO (AZO) standard recipes
Recipe: AZO 20T
Maximum deposition thickness: 100 nm
Temperature: 150 oC - 250 oC
# macrocycles | n | |||||||
---|---|---|---|---|---|---|---|---|
# cycles | 19 | 1 | ||||||
Precursor | DEZ | DEZ | H2O | H2O | TMA | TMA | H2O | H2O |
Nitrogen flow | 150 sccm | 150 sccm | 200 sccm | 200 sccm | 150 sccm | 150 sccm | 200 sccm | 200 sccm |
Pulse time | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s |
Purge time | 0.5 s | 20.0 s | 0.5 s | 20.0 s | 0.5 s | 20.0 s | 0.5 s | 20.0 s |
How to fill out the process log in LabManager:
The pulse time for each precursor equals the total pulse time times the number of cycles in each macrocycle.
DEZ pulse time: (0.1 + 0.1) s * 19 = 3.8 s
TMA pulse time: (0.1 + 0.1 )s * 1 = 0.2 s
H2O pulse time: [(0.1 + 0.1) s * 19] + [(0.1 + 0.1) s * 1] = 4.0 s
The number of cycles for each precursor now equals the number of macrocycles (n).
Recipe: AZO 25T
Maximum deposition thickness: 100 nm
Temperature: 150 oC - 250 oC
# macrocycles | n | |||||||
---|---|---|---|---|---|---|---|---|
# cycles | 24 | 1 | ||||||
Precursor | DEZ | DEZ | H2O | H2O | TMA | TMA | H2O | H2O |
Nitrogen flow | 150 sccm | 150 sccm | 200 sccm | 200 sccm | 150 sccm | 150 sccm | 200 sccm | 200 sccm |
Pulse time | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s |
Purge time | 0.5 s | 20.0 s | 0.5 s | 20.0 s | 0.5 s | 20.0 s | 0.5 s | 20.0 s |
How to fill out the process log in LabManager:
The pulse time for each precursor equals the total pulse time times the number of cycles in each macrocycle.
DEZ pulse time: (0.1 + 0.1) s * 24 = 4.8 s
TMA pulse time: (0.1 + 0.1 )s * 1 = 0.2 s
H2O pulse time: [(0.1 + 0.1) s * 24] + [(0.1 + 0.1) s * 1] = 5.0 s
The number of cycles for each precursor now equals the number of macrocycles (n).
Recipe: AZO 30T
Maximum deposition thickness: 100 nm
Temperature: 150 oC - 250 oC
# macrocycles | n | |||||||
---|---|---|---|---|---|---|---|---|
# cycles | 29 | 1 | ||||||
Precursor | DEZ | DEZ | H2O | H2O | TMA | TMA | H2O | H2O |
Nitrogen flow | 150 sccm | 150 sccm | 200 sccm | 200 sccm | 150 sccm | 150 sccm | 200 sccm | 200 sccm |
Pulse time | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s |
Purge time | 0.5 s | 20.0 s | 0.5 s | 20.0 s | 0.5 s | 20.0 s | 0.5 s | 20.0 s |
How to fill out the process log in LabManager:
The pulse time for each precursor equals the total pulse time times the number of cycles in each macrocycle.
DEZ pulse time: (0.1 + 0.1) s * 29 = 5.8 s
TMA pulse time: (0.1 + 0.1 )s * 1 = 0.2 s
H2O pulse time: [(0.1 + 0.1) s * 29] + [(0.1 + 0.1) s * 1] = 6.0 s
The number of cycles for each precursor now equals the number of macrocycles (n).
Recipe: AZO 35T
Maximum deposition thickness: 100 nm
Temperature: 150 oC - 250 oC
# macrocycles | n | |||||||
---|---|---|---|---|---|---|---|---|
# cycles | 34 | 1 | ||||||
Precursor | DEZ | DEZ | H2O | H2O | TMA | TMA | H2O | H2O |
Nitrogen flow | 150 sccm | 150 sccm | 200 sccm | 200 sccm | 150 sccm | 150 sccm | 200 sccm | 200 sccm |
Pulse time | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s |
Purge time | 0.5 s | 20.0 s | 0.5 s | 20.0 s | 0.5 s | 20.0 s | 0.5 s | 20.0 s |
How to fill out the process log in LabManager:
The pulse time for each precursor equals the total pulse time times the number of cycles in each macrocycle.
DEZ pulse time: (0.1 + 0.1) s * 34 = 6.8 s
TMA pulse time: (0.1 + 0.1 )s * 1 = 0.2 s
H2O pulse time: [(0.1 + 0.1) s * 34] + [(0.1 + 0.1) s * 1] = 7.0 s
The number of cycles for each precursor now equals the number of macrocycles (n).