Specific Process Knowledge/Pattern Design/Travka
The Travka mask set
The travka mask set consists of 7 masks:
- Travka 05 with L-Edit design file: File:Travka 05.tdb and cif file File:Travka 05.cif
- Travka 10 with L-Edit design file: File:Travka 10.tdb and cif file File:Travka 10.cif
- Travka 20 with L-Edit design file: File:Travka 20.tdb and cif file File:Travka 20.cif
- Travka 35 with L-Edit design file: File:Travka 35.tdb and cif file File:Travka 35.cif
- Travka 50 with L-Edit design file: File:Travka 50.tdb and cif file File:Travka 50.cif
- Travka 65 with L-Edit design file: File:Travka 65.tdb and cif file File:Travka 65.cif
- Travka 80 with L-Edit design file: File:Travka 80.tdb and cif file File:Travka 80.cif
The numbers in the end of the mask names refer to the average exposed area of a positive photolithography process. The masks are designed for characterisation of dry etches and holds a number of 1x1 or 1x2 cm fields. The positions of these fields are the same on all masks.
Each field has a number of features (for instance trenches of variable widths) distributed in such a way that the exposed area within the field corresponds to value for each mask.
Below is shown the field distribution on a 4 inch wafer. Click on the links in the figure to find more information on the individual fields.
