Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch)/Silicon Nitride Etch using AOE/Nitride etch with DUV mask

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Silicon nitride etch with STS recommended silicon nitride recipe

• Profiles of etched lines. DUV resist mask and about 320nm Si3N4 on Silicon
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  2min etch: All resist is gone, only a little Si3N4 let and etched down into the Si

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  30sec etch

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  30 sec etch - 1µm pitch

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  30 sec etch - 3µm pitch

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  30 sec etch - 3 µm pitch

Silicon nitride etch with the standard silicon oxide etch

• Etch of LPCVD nitride with DUV KRF resist as mask. The mask is still on. Made by BGHE February 2015
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  Profile of lines with 1µm pitch

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  Profile of lines with 4µm pitch

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  Profile of 2µm line - zoom in on 4µm pitch