Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using AOE/Standard recipe with resist mask/Striation

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Revision as of 11:23, 24 November 2015 by Bghe (talk | contribs) (Created page with " =====Striation: Side wall roughness===== <gallery caption="Striation with different resists used" widths="300px" heights="250px" perrow="4"> Image:Az1_1_06.jpg|Az resist Ima...")
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Striation: Side wall roughness