Specific Process Knowledge/Lithography/EBeamLithography/RaithElphyManual

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Purpose, location and technical specifications

The Raith Elphy system is a pattern generator built onto the LEO Scanning Electron Microscope (SEM) in cleanroom F-2. All users must therefore acquire license to use the SEM LEO before acquiring license to the Raith Elphy system.

Techical Specification

The system can be characterized as follows:

• Electron-beam scanning speeds, f, up to X MHz are available (which is maximum scan speed).
• The acceleration voltage is maximum 25 kV.
• The maximum field-size without stitching is X µm x Y µm.
• The machine has a chip holder that fits to 2 - 3 chips with sizes of approximately 1 x 1 cm2 each. A larger chip or wafer can also be mounted on a holder without a Faraday's cup.

Mounting of chips or wafers into chamber

1. Ventilate the SEM chamber
2. Mount your chips(s) on the Raith Specimen holder
3. Mount the holder on the SEM stage, evacuate the SEM chamber

	Chip holder to Raith Elphy E-beam writer system; the holder has three clamps to hold up to 3 chips and a Faraday's cup to measure beam current. The holder is equipped with a dovetail that fits to the stage of the SEM.

Software login

1. Start the Raith ELPHY Quantum software from the desktop of the Raith computer (screen to the right).
2. Login with the following password:

User ID          administrator
Password         Renrum12

1. Start RemCon32 from the desktop on the SEM computer (screen to the left), choose 'COM 6', right-click and press 'start'