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Specific Process Knowledge/Lithography/EBeamLithography/RaithElphyManual

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Purpose, location and technical specifications

The Raith Elphy system is a pattern generator built onto the LEO Scanning Electron Microscope.

Location

Techical Specification

The system can be characterized as follows:

The spot beam for electron beam writing is generated by a ZrO/W emitter and a four-stage electron beam focusing lens system, see illustration below.

Mounting of chips or wafers into cassette

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