Specific Process Knowledge/Thin Film deposition/ALD/Al2O3 deposition using ALD

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The ALD window for depostion of Al₂O₃ ranges from 150 ^oC to 350 ^oC. XPS measurements shows that at temperatures below 150 ^oC the Al₂O₃ will be contaminated by unreacted TMA molecules, and at temperatures above 350 ^oC the TMA decomposes.

The deposition rate for Al₂O₃ depends on the temperature

Al2O3 thickness as function of number of cycles, temperature 150 oC.

Below the Al₂O₃ thickness as function of number of cycles for deposition temperatures between 150 ^oC and 350 ^oC can be seen. From the equations the number of cycles required for a certain thickess can be calculated.

Al2O3 thickness as function of number of cycles, temperature 150 oC.

Al2O3 thickness as function of number of cycles, temperature 200 oC.

Al2O3 thickness as function of number of cycles, temperature 250 oC.

Al2O3 thickness as function of number of cycles, temperature 300 oC.

Al2O3 thickness as function of number of cycles, temperature 350 oC.

Al2O3 thickness as function of number of cycles, temperature 300 oC.

All results above have been obtained by Evgeniy Shkondin, DTU Danchip, February-March 2014.