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Combined display of all available logs of LabAdviser. You can narrow down the view by selecting a log type, the username (case-sensitive), or the affected page (also case-sensitive).

08:00, 22 August 2014 Bghe talk contribs deleted page Specific Process Knowledge/III-V Process/characterisation/PL Mapper (Moved to characterization)
11:00, 14 August 2014 Bghe talk contribs uploaded File:PECVD2 RI vs B-P graph.jpg
14:33, 1 August 2014 Bghe talk contribs uploaded File:Monthly LabAdviser update 20140801.docx
08:15, 1 July 2014 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/WaferCleaning (content was: "'''Feedback to this page''': '''[mailto:photolith@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowl..." (and the only contributor was "Jehem"))
13:30, 19 June 2014 Bghe talk contribs deleted page Specific Process Knowledge/III-V Process/etch/III V ICP (content was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/III-V_Process/etch/III_V_ICP click here]''' Image:III-VI...")
13:29, 19 June 2014 Bghe talk contribs deleted page Specific Process Knowledge/III-V Process/etch/III V ICP/GaAsnano (content was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowle..." (and the only contributor was "Jmli"))
13:29, 19 June 2014 Bghe talk contribs deleted page Specific Process Knowledge/III-V Process/etch/III V ICP/InP-InGaAsP-InGaAs (content was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowle..." (and the only contributor was "Jmli"))
13:29, 19 June 2014 Bghe talk contribs deleted page Specific Process Knowledge/III-V Process/etch/III V ICP/GaAs-AlGaAs (content was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowle..." (and the only contributor was "Jmli"))
13:29, 19 June 2014 Bghe talk contribs deleted page Specific Process Knowledge/III-V Process/etch/III V ICP/GaN (content was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowle..." (and the only contributor was "Jmli"))
12:41, 19 June 2014 Bghe talk contribs deleted page Specific Process Knowledge/III-V Process/etch/plasys (content was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/III-V_Process/etch/plasys click here]''' ==III-V RIE Plass...")
12:41, 19 June 2014 Bghe talk contribs deleted page Specific Process Knowledge/III-V Process/etch/plasys/III V RIE ETCHES (content was: "==CHF3/O2 etch== A plasma with a gas mixture of CHF3 and O2 is used to etch SiO2 and Si3Ni4 dielectricas; flour radicals are responsible for etching the dielectrica while oxygen rem...")
07:48, 13 June 2014 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using LPCVD (content was: "'''Feedback to this page''': '''[mailto:thinfilm@danchip.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Nitride/Deposition_of_Sili...")
07:48, 13 June 2014 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using LPCVD/Deposition of low stress nitride using the 4" LPCVD nitride furnace (content was: "{{delete | [Side have been moved] }}{{db-g7}} '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition...")
07:48, 13 June 2014 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using LPCVD/Deposition of stoichiometric nitride using the 6" LPCVD nitride furnace (content was: " '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowled..." (and the only contributor was "Pevo"))
07:47, 13 June 2014 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using LPCVD/Using LPCVD silicon nitride as a masking material for KOH etching (content was: "'''Feedback to this page''': '''[mailto:thinfilm@danchip.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/..." (and the only contributor was "Pevo"))
14:55, 27 May 2014 Bghe talk contribs uploaded File:Making a mask 1.jpg (MsUpload)
14:46, 27 May 2014 Bghe talk contribs uploaded File:Thermal treatment 1.jpg (MsUpload)
14:40, 27 May 2014 Bghe talk contribs uploaded File:Making a layer 1.jpg (MsUpload)
14:33, 27 May 2014 Bghe talk contribs uploaded File:Drying.jpg (MsUpload)
14:33, 27 May 2014 Bghe talk contribs uploaded File:Cleaning.jpg (MsUpload)
13:53, 9 May 2014 Bghe talk contribs uploaded File:Monthly LabAdviser update 20140509.docx
12:15, 7 May 2014 Bghe talk contribs deleted page Specific Process Knowledge/III-V Process/etch/III V wet etches (content was: "'''Feedback to this page''': '''[mailto:danchipsupport@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/III-V_Process/etch/III_V_wet_etches click here]'...")
09:41, 6 May 2014 Bghe talk contribs deleted page Specific Process Knowledge/III-V Process/thin film dep/pecvd2 (content was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/III-V_Process/thin_film_dep/pecvd2 click here]''' ==PECVD Plas...")
09:28, 6 May 2014 Bghe talk contribs deleted page Specific Process Knowledge/III-V Process/thin film dep/pecvd2/PECVD2 programs (content was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/III-V_Process/thin_film_dep/pecvd2/PECVD2_programs click here]''...")
12:26, 2 May 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/masks (content was: "== Danchip quality control masks == This section contains a description of some of the quality control designs. * ASE standisation design */daseferie| ..." (and the only contributor was "Jml"))
12:25, 2 May 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/masks/travka (content was: "== The Travka mask set == The travka mask set consists of 7 masks: * Travka 05 with L-Edit design file: file:Travka 05.tdb and cif file file:Travka 05.cif * Trav..." (and the only contributor was "Jml"))
12:24, 2 May 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/masks/daseferie (content was: "== Standardisation design on RIE1 and RIE2 == The quality control procedures on RIE1 and RIE2 are using the dASEfeRIE mask * file:daseferie.pdf | A description of the..." (and the only contributor was "Jml"))
12:23, 2 May 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/masks/daqmask2 (content was: "== Standardisation design on the ASE == The quality control procedure on the ASE is using the daqmask 2 mask * file:Daqmask2.pdf | A description of the daqmask 2 mask..." (and the only contributor was "Jml"))
09:42, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Thermal Process/C1 Furnace Gate Oxide (content was: "==C1 Furnace Gate Oxide== thumb|300x300px|C1 Gate oxide furnace and oxidation of 6inch wafers:positioned in cleanroom 2 C1 Furnace Gate Oxide is a Tempress horizontal furnace for making gate oxide and other very clean o...")
09:25, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/Etching of Platin (content was: "Ething of Platin can be done either wet or dry. For wet etching please see below on this page. Dry etching can be done with IBE by sputtering with Ar ions. Platin can be etched b...")
09:23, 23 April 2014 Bghe talk contribs deleted page 3-week projects (content before blanking was: "*OPTIMERING AF PECVD PROCESSER MED HENBLIK PÅ DYRKNING AF FORSKELLIGE TYPER SILICIUMNITRID Integrated Microfluidic Mixer and Magnetic Bead Trap Torsten Lund-Olesen [http://www.mic.dtu.dk/upload/institutter/mic/forskning/...")
09:23, 23 April 2014 Bghe talk contribs deleted page Bachelor projects (content before blanking was: "*Simon Eskild Jarlgaard, Morten Bo Lindholm Mikkelsen, and Peder Skafte-Pedersen [http://www2.mic.dtu.dk/research/NIL/publications/undergraduate_reports/Midtermreport_Nanofluidics_2005.pdf "Experimental Nanofluidics - Ca...")
09:22, 23 April 2014 Bghe talk contribs deleted page How to add information to LabAdvisor (content was: "===Purpose of the LabAdvisor - sharing of knowledge=== The purpose of LabAdvisor is sharing of knowledge. In our laboratory thousands of experiments have been made and we..." (and the only contributor was "BGE"))
09:12, 23 April 2014 Bghe talk contribs deleted page Projects, Thesis and Articles (content was: "Here we have projects, thesis and articles based on work made at the DANCHIP cleanroom facility. We encourage all our cleanroom users to contribute with their work. *3-week projects *Special courses *Bachelor projects *Master th...")
09:11, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/slopedsidewalls (content was: "{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;" |+ '''Process parameters''' |- ! rowspan="3" width="100"| Recipe ! rowspan="3" width="20"| Step !..." (and the only contributor was "Jml"))
09:11, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/340nmzep (content was: "<gallery caption="The profiles of the 340 nm zep resist" widths="250" heights="200" perrow="3"> image:WF_2C1_feb2011profile_030.jpg|The 30 nm zep profile image:WF_2C1_feb..." (and the only contributor was "Jml"))
09:10, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/211nmzep (content was: "<gallery caption="The profiles of the 340 nm zep resist" widths="250" heights="200" perrow="3"> image:WF_2E02_mar23_2011-030.jpg|The 30 nm zep profile image:WF_2E02_mar23..." (and the only contributor was "Jml"))
09:10, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/180nmzep (content before blanking was: "<gallery caption="The profiles of the 180 nm zep resist" widths="250" heights="200" perrow="3"> image:WF_2B1_feb06_2011-030.jpg|The 30 nm zep profile image:WF_2B1_feb06_2011-060.jpg|The 60 nm zep profile image:WF_2B1_feb0...")
09:09, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/III-V Process/etch/plasys/Specific Process Knowledge/III-V Process/etch/plasys/III V RIE ETCHES (content was: "==test1== A plasma with a gas mixture of CHF<math>_3</math> and O<math>_2</math> is used to etch SiO<math>_2</math> and Si<math>_3</math>Ni<math>_4</math> dielectricas; fl..." (and the only contributor was "Tg"))
08:38, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/Coaters/Spin Track 1 + 2/Spin Track 1 + 2 processing (content was: "bla" (and the only contributor was "Taran"))
08:37, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/DUV Lithography (content was: "=THIS PAGE IS UNDER CONSTRUCTION200px= ==The DUV (Deep Ultra Violet) Lithography process== "int..." (and the only contributor was "BGE"))
08:35, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/UV Lithography (content was: " {|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" |- |- |-style="background:silver; color:black" !Specific Process Knowledge/Thin film deposition/..." (and the only contributor was "Tg"))
08:34, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/Exposure - mask aligner/EVG620 - aligner (content was: "Test evg620 - aligner" (and the only contributor was "192.38.87.76"))
08:33, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/Exposure - mask aligner/EV - aligner (content was: "test ev -aligner 322 × 324px|thumb|The EV-aligner oven is placed in Cleanroom 3.")
08:33, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/Exposure - mask aligner/KS - aligner (content was: "test ks - aligner 300x300px|thumb|The KS aligner is placed in Cleanroom 3.")
08:32, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/MKPR1000 (content was: "hgyffesff" (and the only contributor was "Elk"))
08:32, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/Photoresist Spinners/KS Spinner (content was: "Test KS spinner 322 × 324px|thumb|The KS spinner oven is placed in Cleanroom 3.")
08:31, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/Photoresist Spinners/Track1 (content was: "Test track1 322 × 324px|thumb|Track 1 and 2 is placed in Cleanroom 3.")
08:31, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/Photoresist Spinners/Track2 (content was: "Test track2" (and the only contributor was "BGE"))
08:30, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/Track1 (content was: "test track1" (and the only contributor was "BGE"))