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08:33, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/Exposure - mask aligner/EV - aligner (content was: "test ev -aligner 322 × 324px|thumb|The EV-aligner oven is placed in Cleanroom 3.")
08:33, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/Exposure - mask aligner/KS - aligner (content was: "test ks - aligner 300x300px|thumb|The KS aligner is placed in Cleanroom 3.")
08:32, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/MKPR1000 (content was: "hgyffesff" (and the only contributor was "Elk"))
08:32, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/Photoresist Spinners/KS Spinner (content was: "Test KS spinner 322 × 324px|thumb|The KS spinner oven is placed in Cleanroom 3.")
08:31, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/Photoresist Spinners/Track1 (content was: "Test track1 322 × 324px|thumb|Track 1 and 2 is placed in Cleanroom 3.")
08:31, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/Photoresist Spinners/Track2 (content was: "Test track2" (and the only contributor was "BGE"))
08:30, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/Track1 (content was: "test track1" (and the only contributor was "BGE"))
08:30, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Process flow approval (content was: "== Process Flow Approval == === Why do process flows need to be reviewed === Before implementing process flows in the DTU Danchip cleanroom facilities, the process needs ..." (and the only contributor was "Tg"))
08:29, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/Photoresist Spinners/Maximus (content was: "Test Maximus 300x300px|thumb|The SSE spinner is placed in Cleanroom 4 Class10 yellow room.")
08:29, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using LPCVD/Standard recipes, QC limits and results for the 4" nitride furnace (content was: " '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowled..." (and the only contributor was "Pevo"))
08:28, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using LPCVD/Standard recipes, QC limits and results for the 6" nitride furnace (content was: " '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowled..." (and the only contributor was "Pevo"))
08:24, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD/deposition rate for STOxide (content was: "Deposition rate as a function of deposition time: Measurements done: {| border="2" cellspacing="1" cellpadding="8" |- | Deposition time [s] |Oxide thickness [nm] |Expect..." (and the only contributor was "BGE"))
08:21, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Electroplating of nickel (content was: "jjj" (and the only contributor was "Choi"))
08:19, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Wafer cleaning/7-up (content was: "==Cleaning with 7-up== 300x300px|thumb|7-up for 4" and 6" wafers to the left and for masks to the right: positioned in cleanroom 4 Image:7-up_RR3..." (and the only contributor was "BGE"))
08:19, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Sputter coater Hummer (content was: " '''Feedback to this page''': '''[mailto:thinfilm@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowled..." (and the only contributor was "Pevo"))
08:12, 23 April 2014 Bghe talk contribs deleted page The PROCESS HANDBOOK of DANCHIP (content was: "This wiki is the PROCESS HANDBOOK of DTU Danchip. It covers process knowledge to be used in the cleanroom facility of DTU Danchip. The aim of this book is to gather information on processing in the facility. To begin with we aim at enter...")
08:12, 23 April 2014 Bghe talk contribs deleted page Substrates/III-V (content was: "Various types of materials such as InP, GaN, AlGaAsP collectively called 'III-V'-materials can be processed in various pieces of equipment.The cleanliness of the equipment should be carefully considered prior to subjecting electrical act...")
08:10, 23 April 2014 Bghe talk contribs deleted page Specific etch equipment (content was: "== Choose a dry etch epuipment == *RIE (Reactive Ion Etch) *ASE (Advanced Silicon Etch) *AOE (Advanced Oxide Etch)" (and the only contributor was "192.38.87.76"))
15:35, 22 April 2014 Bghe talk contribs deleted page Sputtering of TiW in Wordentec (content before blanking was: "== Deposition rate == Depening on the settings (pressure and effect) during the sputtering process, the roughness and grain size of the deposited layer can be different. More about how the roughness changes cna be seen [...")
15:34, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano4 (content was: "== The Sinano4.0 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano4.0''' |- ! rowspan="6" align="center"| Recipe | Gas | Cl2 20 scc..." (and the only contributor was "Jml"))
15:34, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano36 (content was: "== The Sinano3.6 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.6''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl3 5 scc..." (and the only contributor was "Jml"))
15:34, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano35 (content was: "== The Sinano3.5 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.5''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl3 5 scc..." (and the only contributor was "Jml"))
15:34, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano34 (content was: "== The Sinano3.4 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.4''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl3 5 scc..." (and the only contributor was "Jml"))
15:33, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano32 (content was: "== The Sinano3.2 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.2''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl3 5 scc..." (and the only contributor was "Jml"))
15:33, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano31 (content was: "== The Sinano3.1 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.1''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl3 3 scc..." (and the only contributor was "Jml"))
15:33, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano3 (content was: "== The Sinano3.0 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.0''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl3 5 scc..." (and the only contributor was "Jml"))
15:32, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan37 (content was: "{| {{table}} | align="center" style="background:#f0f0f0;"|'''Nominal trench line width''' | align="center" style="background:#f0f0f0;"|'''''' | align="center" style="back..." (and the only contributor was "Jml"))
15:32, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan332 (content was: "== The Sinano3.32 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.32''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl3 5 s..." (and the only contributor was "Jml"))
15:32, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan331-2 (content was: "== The Sinano3.31 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.31''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl3 5 s..." (and the only contributor was "Jml"))
15:32, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan331 (content was: "== The Sinano3.31 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.31''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl3 5 s..." (and the only contributor was "Jml"))
15:32, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan33-2 (content was: "== The Sinano3.3 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.3''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl3 5 scc..." (and the only contributor was "Jml"))
15:31, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan33 (content was: "== The Sinano3.3 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.3''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl3 5 scc..." (and the only contributor was "Jml"))
15:29, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP (content was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledg..." (and the only contributor was "Jml"))
15:28, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300/IBE Ti etch (content before blanking was: "==Results from the acceptance test in February 2011== '''Acceptance test for Ti etch:''' {| border="2" cellspacing="0" cellpadding="2" |- !style="background:silver; color:black;" align="left"|. |style="background:WhiteS...")
15:27, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300/IBE Au etch (content before blanking was: "==Results from the acceptance test in February 2011== '''Acceptance test for Au etch:''' {| border="2" cellspacing="0" cellpadding="2" |- !style="background:silver; color:black;" align="left"|. |style="background:WhiteS...")
15:26, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/Etching of polymer/Etch of Photo Resist using RIE (content was: "jklkjljkl" (and the only contributor was "BGE"))
15:21, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy/FEI/gallery/LoVac/TOPAS (content was: "== Images of TOPAS == === Purpose === TOPAS cantilevers have been made by e-beam lithography and mounted on a SU8 chip. The purpose is a general verification of the process. === How to approach the challenge on the FEI SEM === * Mount...")
15:20, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy/FEI/gallery/HiVac/bge al poly (content was: "== Images of aluminium on polysilicon == === Purpose === To check if the liftoff process with aluminium on e-beam defined nanostructures is ok. === How to approach the ..." (and the only contributor was "Jml"))
15:20, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy/FEI/gallery/LoVac/SU8 (content was: "== Image of SU8 == === Purpose === To check if the SU8 is ok. === How to approach the challenge on the FEI SEM === 370x370px|thumb|left|" (and the only contributor was "Jml"))
15:19, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Characterization/Measurement of optical constants (content was: "Measurement if the optical constants of a thin film is measured together with the thickness of the film either by ellipsometry (using the ellipsometer), by refraction (u..." (and the only contributor was "BGE"))
15:19, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Characterization/Hydrophobicity measurement (content was: "Drop Shape Analyzer" (and the only contributor was "Jml"))
15:16, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Back-end processing/ (content was: "'''Feedback to this page''': '''[mailto:danchipsupport@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Kn..." (and the only contributor was "Kabi"))
15:15, 22 April 2014 Bghe talk contribs deleted page Solar cell process flow (content was: "<!-- This page is under construction, and far from finished. (Some things might even be compleatly wrong, while we are constructing the page) '''Feedback to this page''..." (and the only contributor was "Pvl"))
15:15, 22 April 2014 Bghe talk contribs deleted page Silicon nitride (content was: "== Etch of Silicon Nitride == Silicon nitride can be etched using either wet chemistry or dry etch equipment. Wet chemistry is mainly used to remove all the nitride on the surface (backside and frontside) of a wafer. Dry etching etches ...")
15:14, 22 April 2014 Bghe talk contribs deleted page Sandbox (content was: "test test test" (and the only contributor was "AndersF"))
15:14, 22 April 2014 Bghe talk contribs deleted page Sandblasting (content was: "=Sandblasting= Sandblasting is a very fast way of structuring glass and can be used for e.g. making inlet holes in glass substrates for microfluidic devices. The s..." (and the only contributor was "Jehan"))
15:13, 22 April 2014 Bghe talk contribs deleted page Roughness of TiW (content before blanking was: "== Roughness, grain size and uniformity of TiW layers == For the sputter process, the effect and argon pressure can be set to different values. Depending on the process parameters, the deposited layers will have differen...")
15:12, 22 April 2014 Bghe talk contribs deleted page Roughness, grain size and uniformity of TiW layers (content was: "For the sputter process, the effect and argon pressure can be set to different values. Depending on the process parameters, the deposited layers will have different charact..." (and the only contributor was "Kn"))
15:11, 22 April 2014 Bghe talk contribs deleted page Process SPecific Knowledge/Photolithography/AZ5214E diluted positive resist (content was: "==Pretreatment== {{testtemplate}} ==Spinning== ==Baking== ==Exposure== ==Developing==")
15:11, 22 April 2014 Bghe talk contribs deleted page Process Flow (content before blanking was: "*alignercheck *Hvad er på skiven fra start? **DSP Skiver m nitrid og poly *proces to check you bottomaligning *alignercheck *Hvad er på skiven fra start? **DSP Skiver m nitrid og poly # HMDS # PR1_5 bagside...")