Specific Process Knowledge/Thermal Process/BCB Curing Oven

From LabAdviser

This page is under contruction

BCB Curing Oven

The BCB Curing Oven is mainly used for curing of BCB (bisbenzocyclobutene) and for alloying of metal in a nitrogen atmosphere.

During processing the furnace is rapidly heated by use of five halogen lamps below the sample. The furnace is purged with a controlable nitrogen flow. There is vacuum on the furnace.

The user manual, user APV, technical information and contact information can be found in LabManager:

The BCB Curing Oven. Located in the III-V Lab

BCB Curing Oven

Process information

There are no standard processes on the furnace.

Equipment performance and process related parameters

Equipment Resist Pyrolysis Furnace
Purpose
  • BCB curing and metal alloying
Process parameter range Temperature
  • 0 - 450oC
Nitrogen flows
  • Low N2 flow: 5 SLM
  • High N2 flow: Max 16.7 SLM
Substrates Batch size
  • Several small samples (placed on a carrier wafer)
  • One 50 mm wafer (placed on a carrier wafers)
  • One 100 mm wafer
Allowed materials
  • BCB
  • Co-polymer
  • Silicon
  • Silicon oxide
  • Silicon nitride
  • Quartz
  • Resist (prebaked)
  • III-V materials
  • Metal