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Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE process trends

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< Specific Process Knowledge | Etch | IBE⁄IBSD Ionfab 300

Revision as of 10:36, 31 July 2012 by BGE (talk | contribs) (New page: =Some general process trends= This page is supposed to gather some general process trends and good advise for designing IBE recipes. ==Etch rate== {| border="2" cellspacing="2" cellpaddin...)

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Some general process trends

This page is supposed to gather some general process trends and good advise for designing IBE recipes.

Etch rate

Etch rate	Parameters
increases with	Beam current
increases with	Beam voltage
increases with	Beam current * Beam voltage
Not significantly effected by	Stage angle
Not significantly effected by	Accelerator voltage

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