Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE process trends

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Revision as of 10:36, 31 July 2012 by BGE (talk | contribs) (New page: =Some general process trends= This page is supposed to gather some general process trends and good advise for designing IBE recipes. ==Etch rate== {| border="2" cellspacing="2" cellpaddin...)
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Some general process trends

This page is supposed to gather some general process trends and good advise for designing IBE recipes.

Etch rate

Etch rate Parameters
increases with Beam current
increases with Beam voltage
increases with Beam current * Beam voltage
Not significantly effected by Stage angle
Not significantly effected by Accelerator voltage
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