Specific Process Knowledge/Wafer cleaning

Clean with:

• RCA - Two step process to remove organics and metals
• 7-up - Fake piranha etch of wafers and masks - removes organics and alkali ions
• Piranha - Removes organics and alkali ions
• BHF - Removing native oxide, etching of predep glass etc.
• IMEC - Cleaning before fusion bonding
• Soap Sonic - Cleaning of "dirty" wafers when entering the cleanroom