Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using RIE1 or RIE2/Images of 1SIO2mbr with burned resist mask
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Revision as of 08:36, 29 June 2017 by Bghe (talk | contribs) (→Etch of SiO2 using the recipe 1SIO2mbr with burned resist as masking material, by Berit Geilman Herstrøm (BGE) from Danchip@DTU)
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Etch of SiO2 using the recipe 1SIO2mbr with burned resist as masking material
Berit Geilman Herstrøm (BGE) from Danchip@DTU