Specific Process Knowledge/Thin film deposition/Deposition of AZO
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AZO can be deposited by Sputtering process and atomic layer deposition (ALD). In the chart below you can compare the different deposition equipment.
E-beam evaporation (Lesker) | Atomic layer deposition (ALD Picosun R200) | |
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General description | Sputter deposition of AZO | Atomic layer deposition of AZO |
Pre-clean | RF Ar clean | RF Ar clean |
Layer thickness | 10Å to 1µm* | 10Å to |
Deposition rate | 2Å/s to 15Å/s | ~0.3Å/s |
Batch size |
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Allowed materials |
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Comment |
* For thicknesses above 200 nm permission is required.