Specific Process Knowledge/Lithography/EBeamLithography/RaithElphyManual
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Purpose, location and technical specifications
The Raith Elphy system is a pattern generator built onto the LEO Scanning Electron Microscope.
Location
Techical Specification
The system can be characterized as follows:
- The spot beam for electron beam writing is generated by a ZrO/W emitter and a four-stage electron beam focusing lens system, see illustration below.