Specific Process Knowledge/Thermal Process/Furnace: Multipurpose annealing/Acceptance test
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The acceptance for the Multipurpose Anneal furnace was performed in November 2014 by ATV Technologie.
Recipe: "vr_dryOx_1000C_120min_150_5Wafer_D1_mit_Inliner_oPurgering.ATV"
Oxidation time: 80 min
Oxidation temperature: 1050 oC (all temoperature zones)
O2 flow: 1 slm
The oxidation has been done with 150 mm wafer, and with 30 wafers in the furnace.
Wafer 4 (towards the door), wafer 16 and wafer 28 (towards the service area) were measured.
Results
The oxide thickness has been measured in 13 points on each wafer using the M-2000V ellipsometer.
| Date | Wafer 4 | Wafer 16 | Wafer 28 | Center point only | |||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Average oxide thickness [nm] | St. deviation | Non-uniformity [%] | Average oxide thickness [nm] | St. deviation | Non-uniformity [%] | Average oxide thickness [nm] | St. deviation | Non-uniformity [%] | Average oxide thickness [nm] | St. deviation | Non-uniformity [%] | ||
| Run 1 | 28-01-2015 | 109.7 | 1.0 | 1.7 | 107.7 | 0.9 | 1.1 | 106.5 | 0.8 | 1.2 | 107.0 | 2.1 | 1.9 |
| Run 2 | 28-01-2015 | 107.3 | 1.7 | 2.4 | 105.0 | 1.4 | 1.7 | 107.3 | 0.7 | 0.9 | 105.7 | 1.0 | 0.9 |
| Run 3 | 30-01-2015 | 103.6 | 0.8 | 1.1 | 102.6 | 0.6 | 1.2 | 102.2 | 0.6 | 1.1 | 102.9 | 1.0 | 1.0 |
| Average | 106.9 | 1.2 | 1.7 | 105.1 | 1.0 | 1.3 | 105.3 | 0.7 | 1.1 | 105.2 | 1.4 | 1.3 | |
| Run-to-run | ||
|---|---|---|
| Average oxide thickness [nm] | St. deviation | Non-uniformity [%] |
| 105.2 | 2.1 | 2.0 |