Specific Process Knowledge/Wafer cleaning

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< Specific Process Knowledge
Revision as of 13:28, 20 September 2007 by 192.38.87.76 (talk) (New page: == Clean with: == *RCA - ''two step process to remove organics and metals'' *7-up - ''piranha etch of wafers and masks - removes organiscs and alkali ions'' *BHF - ''etching of predep gla...)
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Clean with:

  • RCA - two step process to remove organics and metals
  • 7-up - piranha etch of wafers and masks - removes organiscs and alkali ions
  • BHF - etching of predep glass
  • Polisher - Grammophone polisher for mechanical clean of glass wafers
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