Specific Process Knowledge/Thin film deposition/MVD

The Molecular Vapor Deposition Tool

The MVD is located in cleanroom 1

The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. They are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. In most cases the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL.

The shallolr recipe

Common parameters		Multiplexed parameters
Parameter	Setting	Parameter	Etch	Passivation
Temperature	10oC	SF6 Flow	260 sccm	0 sccm
No. of cycles	31	O2 Flow	26 sccm	0 sccm
Process time	5:56 mins	C4F4 Flow	0 sccm	120 sccm
APC mode	manual	RF coil	2800 W	1000 W
APC setting	86.8 %	RF Platen	16 W	0 W
		Cycle time	6.5 s	5 s

The flat recipe

O2 plasma	Chemical # 1 (vapor order 1)	Chemical # 2 (vapor order 2)	Processing
			Flow	Setting	Parameter	Etch	Passivation
			Temperature	10oC	SF6 Flow	260 sccm	0 sccm
No. of cycles	31	O2 Flow	26 sccm	0 sccm
Process time	5:56 mins	C4F4 Flow	0 sccm	120 sccm
APC mode	manual	RF coil	2800 W	1000 W
APC setting	86.8 %	RF Platen	16 W	0 W
		Cycle time	6.5 s	5 s