Specific Process Knowledge/Thin film deposition/ALD Picosun R200/AZO deposition using ALD

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	EtZn₂O	EtZn₂O	H₂O	H₂O	TMA	TMA	H₂O	H₂O
Nitrogen flow			200 sccm	200 sccm	150 sccm	150 sccm	200 sccm	200 sccm
Pulse time	0.1 s	0.1 s	0.1 s	0.1 s	0.1 s	0.1 s	0.1 s	0.1 s
Purge time	0.5 s	20.0 s	0.5 s	20.0 s	0.5 s	20.0 s	0.5 s	20.0 s
# cycles	20				1

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