Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using AOE/Standard recipe with resist mask/Striation
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Revision as of 12:37, 18 April 2016 by Bghe (talk | contribs) (→Sidewall roughness effected by UV curing and heat treatment of AZ5214E resist 70px)
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Striation: Side wall roughness
Roughness of the resist after etch measured with the AFM