Specific Process Knowledge/Thin Film deposition/ALD/Al2O3 deposition using ALD

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Al2O3 thickness as function of number of cycles, temperature 300 oC. Evgeniy Shkondin, DTU Danchip, February 2014.

[[Image:ALD Al2O3 grow rate 200C.jpg|300x300px|thumb|center|Al2O3 thickness as function of number of cycles, temperature 300 oC. Evgeniy Shkondin, DTU Danchip, February 2014.|}