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| Line 2: |
Line 2: |
| [[Image:SSEspinner2.jpg|200 × 200px|thumb|The SSE spinner MAXIMUS: positioned in Cleanroom 13.]] | | [[Image:SSEspinner2.jpg|200 × 200px|thumb|The SSE spinner MAXIMUS: positioned in Cleanroom 13.]] |
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| == Process information ==
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| Link to process pages
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| *[[Specific_Process_Knowledge/Photolithography/AZ5214E_standard_resist_-_positive_process|Positive process with AZ5214E resist]]
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| *[[Specific_Process_Knowledge/Photolithography/AZ5214E_standard_resist_-_reverse_process|Reverse process with AZ5214E resist]]
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| *[[Specific_Process_Knowledge/Photolithography/AZ4562_standard_resist_-_positive_process|Positive process with AZ4562 resist]]
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| *[[Specific_Process_Knowledge/E-beam_lithography|E-beam process with ZEP 520A resist]]
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| Information about resist can be found here:
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| * [http://groups.mrl.uiuc.edu/dvh/pdf/AZ5214E.pdf AZ5214E ]
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| * [http://www.microchemicals.eu/micro/az_4500_series.pdf AZ4562]
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| * [http://www.zeonchemicals.com/pdfs/ZEP520A.pdf ZEP520A]
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| ==KS Spinner== | | ==KS Spinner== |
| [[Image:KSspinner.JPG|200×200px|right|thumb|The KS spinner is placed in Cleanroom 3.]] | | [[Image:KSspinner.JPG|200×200px|right|thumb|The KS spinner is placed in Cleanroom 3.]] |
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| == Process information ==
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| Link to process pages
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| *[[Specific_Process_Knowledge/Photolithography/AZ5214E_standard_resist_-_positive_process|Positive process with AZ5214E resist]]
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| *[[Specific_Process_Knowledge/Photolithography/AZ5214E_standard_resist_-_reverse_process|Reverse process with AZ5214E resist]]
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| *[[Specific_Process_Knowledge/Photolithography/AZ4562_standard_resist_-_positive_process|Positive process with AZ4562 resist]]
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| *[[Specific_Process_Knowledge/Photolithography/SU8|Process with SU8 resist]]
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| Information about resist can be found here:
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| * [http://groups.mrl.uiuc.edu/dvh/pdf/AZ5214E.pdf AZ5214E ]
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| * [http://www.microchemicals.eu/micro/az_4500_series.pdf AZ4562]
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| * [http://microchem.com/pdf/SU-82000DataSheet2000_5thru2015Ver4.pdf SU8 2005]
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| * [http://microchem.com/pdf/SU-82000DataSheet2025thru2075Ver4.pdf SU8 2075]
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| ==Manual Spinner( Polymers)== | | ==Manual Spinner( Polymers)== |
| [[Image:Opticoat.jpg|200×200px|right|thumb|The Manual Spinner(Polymers) is placed in fumehood in Cleanroom 3.]] | | [[Image:Opticoat.jpg|200×200px|right|thumb|The Manual Spinner(Polymers) is placed in fumehood in Cleanroom 3.]] |
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| The Manual Spinner(Polymers), Opticoat SB20+, from SSE Sister Semiconductor Equipment, are dedicated for spinning of imprint polymers, e-beam resist in small batches, SU8 resist and other polymers with extra addictive like color, nano particles etc.
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| There are 2 hotplates with temperature range up to 250C, placed in the same fumehood, which can be used for baking before/after spinning.
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| '''The user manual(s), quality control procedure(s) and results and contact information can be found in LabManager:'''
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| Equipment info in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=251 LabManager]
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| == Process information ==
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| Link to process pages
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| ==SÜSS Spinner-Stepper== | | ==SÜSS Spinner-Stepper== |
| [[Image:Gamma_2M.jpg|200×200px|right|thumb|The SÜSS Spinner-Stepper is placed in Stepper room.]] | | [[Image:Gamma_2M.jpg|200×200px|right|thumb|The SÜSS Spinner-Stepper is placed in Stepper room.]] |
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| This spinner is dedicated for spinning DUV resists. The spinner is fully automatic and can run up to 25 substrates in a batch 4", 6", and 8" size. The machine is equipped with the 3 resist lines, a automatic syringe system and a solvent line for cleaning and back-side rinse.
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| '''The user manual(s), quality control procedure(s) and results and contact information can be found in LabManager:'''
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| Equipment info in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=279 LabManager]
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| Information about resist can be found here:
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| * Bottom Anti Reflection Coating (BARC)[http://www.brewerscience.com/products/arc/dry-etch-arc-coatings/248nm-products/duv42s DUV 42S-6 ].
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| *[[Media:Datasheet_DUV42S.pdf |Datasheet DUV42S-6]].
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| *Positive DUV resist for spinning in 300-600 thickness range [[Media:M230Y_PSM_annular_130C_PEB.pdf|KRF M230Y]].
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| == Process information ==
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| Link to process pages
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| ==Equipment performance and process related parameters== | | ==Equipment performance and process related parameters== |
