Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon: Difference between revisions
| Line 26: | Line 26: | ||
*Standard polySi | *Standard polySi | ||
*Amorphous polySi | *Amorphous polySi | ||
*Boron doped polySi (BCl< | *Boron doped polySi (BCl<sub>3</sub> dopant) | ||
4" furnace: | 4" furnace: | ||
*Standard polySi | *Standard polySi | ||