Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE/ICP recipe for SiO2: Difference between revisions
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!Material to be etched | !Material to be etched | ||
!Recipe: | !Recipe: SIO2_ICP | ||
!Testing | !Testing othe etch rate in nitride | ||
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|Etch rate in SiO2 | |Etch rate in SiO2 |
Revision as of 14:20, 15 May 2023
This recipe was taken from the ICP Metal etch, with a slight difference in the platen temperature.