Specific Process Knowledge/Lithography/Coaters/labspin: Difference between revisions
| Line 151: | Line 151: | ||
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Purpose | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Purpose | ||
|style="background:LightGrey; color:black"|Labspin | |style="background:LightGrey; color:black"|Labspin | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
Spin coating of resist ONLY in dedicated bowlsets | Spin coating of resist ONLY in dedicated bowlsets | ||
| Line 157: | Line 157: | ||
|- | |- | ||
|style="background:LightGrey; color:black"|All purpose | |style="background:LightGrey; color:black"|All purpose | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
Spin coating of dirty substances in '''All purpose''' | Spin coating of dirty substances in '''All purpose''' | ||
<br> | <br> | ||
| Line 164: | Line 164: | ||
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameters | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameters | ||
|style="background:LightGrey; color:black"|Spin speed | |style="background:LightGrey; color:black"|Spin speed | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
*Vacuum chuck: 100 - 5000 rpm <br> | *Vacuum chuck: 100 - 5000 rpm <br> | ||
*Edge handling chuck: Max. 3000 rpm | *Edge handling chuck: Max. 3000 rpm | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Spin acceleration | |style="background:LightGrey; color:black"|Spin acceleration | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
*200 - 4000 rpm/s <br> | *200 - 4000 rpm/s <br> | ||
| Line 175: | Line 175: | ||
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | ||
|style="background:LightGrey; color:black" |Substrate size | |style="background:LightGrey; color:black" |Substrate size | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
*Chips 5x5 mm and up | *Chips 5x5 mm and up | ||
*50 mm wafers | *50 mm wafers | ||
| Line 183: | Line 183: | ||
|- | |- | ||
| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black"|Allowed materials | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
All cleanroom materials | All cleanroom materials | ||
| Line 190: | Line 190: | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Batch | |style="background:LightGrey; color:black"|Batch | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
1 | 1 | ||
|- | |- | ||
Revision as of 07:44, 10 May 2023
Spin coater: Labspin
|
|
| Spin Coater: Labspin 02 | Spin Coater: Labspin 03 + fumehood 11 |
| Loacted in wetbench 08 in E-5 | Located in wetbench 09 in E-5 |
| LabSpin 6, Süss MicroTec | LabSpin 6, Süss MicroTec |
Training video: LabSpin02 + 03
Process information
Spin curves (LabSpin 6):
More information on resists (incl. spin curves) is available in the resist overview.
Available bowlsets:
| Component solvent | Cleaning solvent | List of resists | Comments | |
|---|---|---|---|---|
| AZ resist | PGMEA/Ethyl Lactate | Acetone | AZ 5214E, AZ 4562, AZ MiR 701, AZ nLOF 2000 series,
mr-I8100R? |
Two sets available |
| CSAR/ZEP/mrEBL/PMMA | Anisole | Remover 1165 | AR-P 6200 series (CSAR 62), ZEP520A, mr EBL 6000, PMMA (in anisole),
UV5?, mr-T85L?, XNIL26?, mri8000?, mr-I 7010E?, mr-XNIL26_SF?, mrNIL210? |
|
| HSQ/AR-N 8200 | MIBK/PGMEA | Acetone | HSQ (FOx series), AR-N 8200 | |
| OrmoComp/OrmoStamp | Propyl Acetate | Acetone | OrmoComp, OrmoStamp, OrmoPrime, OrmoClad?
Inkron?, mr-I-7030R?, mr-I 8020E?, mr-I-7010E?, mrNIL210?, mr-I 8500E?, mr-T85?, MRT HI01XP?, Protek B3?, mrUVCur21?, mr-I 8100E_XP?, mrNIL210?, MRT HI01XP?, mr-NIL 6000.3E?, mr-I 8100R_XP? |
|
| BCB/CYCLOTENE | Mesitylene | T1100 | 3022-X, 4022-X | |
| Epoxy/Acrylate | Cyclopentanone/PGMEA | Acetone | SU-8 2000 series, mr-DWL, LOR (1A, 3A, 5A)
mr-i 8030e?, mr-NIL200?, DELO-PRE/OM4310?, OrmoStamp?, Inkron?, mr-I 8020E?, OM4310? |
|
| AR-P 617/AR-N 7520 | PGME/PGMEA | Acetone | AR-N 7500 series | |
| Polymer Ps-b-PDMS/block copolymer | Heptane | Ethyl Acetate | ||
| DIRTY bowlset | Anything Organic | Use the appropriate cleaning reagent for your resist |
| Purpose | Labspin |
Spin coating of resist ONLY in dedicated bowlsets Please do NOT use substances which is not for the dedicated bowlsets |
|---|---|---|
| All purpose |
Spin coating of dirty substances in All purpose
| |
| Process parameters | Spin speed |
|
| Spin acceleration |
| |
| Substrates | Substrate size |
|
| Allowed materials |
All cleanroom materials Please ONLY use substances which is for the dedicated bowlsets in labspins | |
| Batch |
1 |