October 2010 Survey: Difference between revisions
No edit summary |
No edit summary |
||
Line 11: | Line 11: | ||
<br> | <br> | ||
<h4> Comment 1</h4> | <h4> Comment 1</h4> | ||
<h5> For some tools you are extremely specific with rules to follow, but for others you allow highly contaminating processes - like e.g. the SSE spinner where you allow | <h5> For some tools you are extremely specific with rules to follow, but for others you allow highly contaminating processes - like e.g. the SSE spinner where you allow thick resists that contaminates a system that is intended to be used for nanolithography (e-beam and nanoimprint). </h5> | ||
<i> Action: </i> <br> | <i> Action: </i> <br> |
Revision as of 14:26, 5 January 2011
Survey introduction
The October 2010 survey was the fourth survey carried out using a format where individual cleanroom users were asked about their view on various parts of using DTU Danchip's facilities and in particular the cleanroom facilities.
The questionaire was send to 169 registered users (based on the logging of cleanroom use) unfortunately 2 of the e-mail adresses was obsolete and thus the mails bounced, which brought the total number of potential answers to 167 . In total 24 persons answered the questionaire which means an answer fraction of 14% regardless of whether or not the bounces should be included in the total.
This page deals with the comments given as part of the questionaire. Danchip values this feedback highly.
Comments
The comments appear here as they were written in the feedback field of the questionaire. In a few cases they have been anonymized or the worst spelling mistakes corrected.
Comment 1
For some tools you are extremely specific with rules to follow, but for others you allow highly contaminating processes - like e.g. the SSE spinner where you allow thick resists that contaminates a system that is intended to be used for nanolithography (e-beam and nanoimprint).
Action:
Comment 2
The SEM outside cleanroom will be nice.
Action: The SEM outside the cleanroom is operational now - please contact Jonas for training.
Comment 3
Quality control of equipment is not always sufficient: For some tools pass/fail criteria for standardization tests is badly defined. I am missing clear reaction plan for equipment that is measured to be out of spec.
Action:
Comment 4
I use the KS Aligner quite a bit when I am in the cleanroom, and for most days this machine is so heavily booked that it almost is preventing me from running a continuous process in a single day. Would it be possible for Danchip to buy a second exposure system that could be for simpler exposures and not for complicated alignment? I know there is an aligner in CleaR at Risø. Danchip might want to look into having this system transported to Lyngby.
Action: The KS Aligner does get a good deal of load. However there are two other aligners in the cleanroom, the EVG 620 and the III-V aligner, either of these may also be useful for your processing, and are not heavily booked.
Danchip has had more than one look at the CleaR aligner but frankly we don't fint it worthwhile to install and maintain given its present condition.
Comment 5
I think you work very well and you are always open to handle new challenges.
Action:
Comment 6
Your UV mask ordering procedure does not work
Action:
Comment 7
There is some heavy booking with SEM
Action: Yes there is heavy booking on the two SEM's. The good news is that the SEM outside the cleanroom is operational. But the even better news is that we are getting a third SEM in the cleanroom - we expect it to be operational before christmas (2010). Also you may also wish to contact DTU CEN to gain access to more SEM's, they have a number of tools which are superior to the ones at Danchip.
Comment 8
Staff helpfulness: Very very satisfied!
Action:
Comment 9
It would be nice to be able to go online and see who is in the cleanroom.
Action: