Specific Process Knowledge/Thin film deposition/Deposition of Tungsten/Evaporation of W in Temescal: Difference between revisions
Created page with "=Deposition of W in Temescal= During the e-beam deposition of Tungsten, extremely bright light and heat are generated! Lower density film than expected due to porosity. Consider using sputtering instead. Power 33W, stable rate, tooling 86%. Measured thickness 20 nm (XRR). <b>Wait for base pressure 3 10-7Torr before start.</b> {| border="2" cellspacing="2" cellpadding="2" colspan="3" |bgcolor="#98FB98" |'''Deposition of Tungsten. Dep. rate: 0.5Å/s, Thickness sp.:..." |
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During the e-beam deposition of Tungsten, extremely bright light and heat are generated! Lower density film than expected due to porosity. Consider using sputtering instead. | During the e-beam deposition of Tungsten, extremely bright light and heat are generated! Lower density film than expected due to porosity. Consider using sputtering instead. | ||
Power 33W, stable rate, tooling 86%. Measured thickness 20 nm (XRR). | Power 33W, stable rate, tooling 86%. Measured thickness 20 nm ([[Specific Process Knowledge/Characterization/XRD/XRD_SmartLab|XRR]]). | ||
<b>Wait for base pressure 3 10-7Torr before start.</b> | <b>Wait for base pressure 3 10-7Torr before start.</b> | ||
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<gallery caption="XRR analysis of e-beam deposited Ta thin film." widths="500px" heights="500px" perrow="1"> | <gallery caption="XRR analysis of e-beam deposited Ta thin film." widths="500px" heights="500px" perrow="1"> | ||
image:eves_20220225_W_Temescal.png| X-ray reflectivity. Measurement and Fit. Tooling 86%. <b>Seems that this deposition suffered from a high oxidation level. (low fitted density of the main Ta layer) or poures formation</b> | image:eves_20220225_W_Temescal.png| [[Specific Process Knowledge/Characterization/XRD/XRD_SmartLab|X-ray reflectivity]]. Measurement and Fit. Tooling 86%. <b>Seems that this deposition suffered from a high oxidation level. (low fitted density of the main Ta layer) or poures formation</b> | ||
</gallery> | </gallery> |
Revision as of 16:11, 2 January 2023
Deposition of W in Temescal
During the e-beam deposition of Tungsten, extremely bright light and heat are generated! Lower density film than expected due to porosity. Consider using sputtering instead.
Power 33W, stable rate, tooling 86%. Measured thickness 20 nm (XRR).
Wait for base pressure 3 10-7Torr before start.
Deposition of Tungsten. Dep. rate: 0.5Å/s, Thickness sp.: 20nm | |||||||||||||||||||||||||||||||||||||||||||
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X-ray reflectivity. Measurement and Fit. Tooling 86%. Seems that this deposition suffered from a high oxidation level. (low fitted density of the main Ta layer) or poures formation