Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using AOE: Difference between revisions
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The AOE was upgraded in the spring 2010 and there has been a lot of problems with it since. It is running now but we still do not at a very good recipe. Ask Berit (BGE) for the resent progress in process development. | |||
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==Etching of micro structures in Silicon Oxide with photoresist or (poly)silicon as masking material== | ==Etching of micro structures in Silicon Oxide with photoresist or (poly)silicon as masking material== | ||
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Revision as of 12:54, 14 October 2010
The AOE was upgraded in the spring 2010 and there has been a lot of problems with it since. It is running now but we still do not at a very good recipe. Ask Berit (BGE) for the resent progress in process development.