Specific Process Knowledge/Etch/OES: Difference between revisions
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* Pegasus 1 | * Pegasus 1 | ||
* Pegasus 4 | * Pegasus 4 | ||
The section below describes the principle behind | The section below describes the principle behind the optical endpoint detection system. | ||
== Optical Emission Spectroscopy == | == Optical Emission Spectroscopy == | ||
As an example, let's take the etching of silicon by fluorine in one of the dry etchers. The fluorine is supplied to the system as SF<sub>6</sub> that is decomposed by the plasma into smaller and smaller molecules until the radical F<sup>*</sup> is formed. | |||
=fdgsdfg= | =fdgsdfg= | ||