Jump to content

Specific Process Knowledge/Thin film deposition/Deposition of Titanium Nitride: Difference between revisions

← Older editNewer edit →
VisualWikitext
Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
Line 5: Line 5:


== Deposition of Titanium nitride ==
== Deposition of Titanium nitride ==
Thin films of titanium nitride can only be deposited in the [[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)|ALD2]] at the moment. More information about the process can be found [[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/TiN deposition using ALD2|here]].
 
Thin films of titanium nitride can be deposited by [[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)|ALD]] and [[Specific Process Knowledge/Thin film deposition/Lesker|sputering]] methods.  
 
Information about the ALD process can be found [[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/TiN deposition using ALD2|here]].
 
Information about the sputtering process can be found [[Specific Process Knowledge/Thin film deposition/Deposition of Titanium Nitride/Deposition of Titanium Nitride using Lesker sputter tool|here]].


==Comparison between sputtering and ALD methods for deposition of Titanium Nitride.==
==Comparison between sputtering and ALD methods for deposition of Titanium Nitride.==
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Titanium_Nitride"