Specific Process Knowledge/Lithography/4562: Difference between revisions
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==Priming== | ==Priming== | ||
Using HMDS priming with AZ 4562 seems to cause more problems than it solves, and | Using HMDS priming with AZ 4562 seems to cause more problems than it solves, and is generally not recommended. HMDS priming seems to make the adhesion worse, maybe due to accumulation of N2 at the resist-substrate interface during exposure. A combination of oxygen plasma treatment (7min @ 400ml/min O<sub>2</sub> and 500W power) and HMDS has been successful for a 14µm coating, but has not been tested further. | ||
If adhesion failure is an issue, a dehydration bake (e.g. 1min at 100°C) just before spin coating is recommended. Storing the coated substrates before exposure also leads to adhesion failure after as little as a couple of days. | If adhesion failure is an issue, a dehydration bake (e.g. 1min at 100°C) just before spin coating is recommended. Storing the coated substrates before exposure also leads to adhesion failure after as little as a couple of days. | ||