LabAdviser/314/Microscopy 314-307/FIB/Helios: Difference between revisions
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Attachments | Attachments | ||
- Gas Injection System (GIS) for | - Gas Injection System (GIS) for W and Pt both E and I beams. C deposition E beam only. XeF2 and H2O etching Ion beam only. | ||
- OmniProbe for in-situ manipulations | - OmniProbe for in-situ manipulations | ||