Specific Process Knowledge/Lithography/4562: Difference between revisions

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==Spin coating==
==Spin coating==


[[Image:4562spincurves.JPG|500x500px|thumb|Spin curves for AZ MiR 701 (29cps) using a 30s spin-off, and a 60s@90°C softbake (proximity bake for Gamma)]]
[[Image:4562spincurves.JPG|500x500px|thumb|Spin curves for AZ 4562 using 60s spin-off and 60s@100°C softbake on LabSpin, and 30s spin-off and 300s@100°C 1mm proximity softbake on Gamma]]


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Revision as of 10:44, 24 July 2019

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AZ 4562 is a positive UV photoresist for thick coatings (5µm and above).

Priming

Spin coating

Spin curves for AZ 4562 using 60s spin-off and 60s@100°C softbake on LabSpin, and 30s spin-off and 300s@100°C 1mm proximity softbake on Gamma


Exposure

Development

The recommended development speed for AZ 4562 is 2µm/min. A 6.2µm resist film thus requires 3min development, usually as three 60s puddles of TMAH (AZ 726 MIF). 10µm AZ 4562 has successfully been developed using 4x60s development

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