Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

Revision as of 09:51, 12 April 2019 view source Taran (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891 3,526 edits →Substrate centring and flat alignment ← Older edit		Revision as of 09:52, 12 April 2019 view source Taran (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891 3,526 edits →Substrate centring and flat alignment Newer edit →
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	'''Result of using only the alignment tool, pushing it to the extremes:'''		'''Result of using only the alignment tool, pushing it to the extremes:'''

	-11.08 to 5.54mRad, corresponding to -0.6 to 0.3°, average -0.1±0.5°		-11.08 to 5.54mRad, corresponding to -0.6 to 0.3°, average -0.1±0.5°