Specific Process Knowledge/Thin film deposition/Deposition of Platinum: Difference between revisions
→Platinum deposition: Replaced Alcatel with Temescal and adjusted params |
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|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
!Allowed materials | !Allowed materials | ||
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*Silicon oxide | *Silicon oxide | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
! Comment | ! Comment | ||
| As of August 2018, Pt has not yet been deposited in the Temescal. Please contact the Thin Film group to develop a process. | | As of August 2018, Pt has not yet been deposited in the Temescal. | ||
Please contact the Thin Film group to develop a process. | |||
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