Specific Process Knowledge/Thin film deposition/Deposition of Aluminium: Difference between revisions
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! Sputter deposition ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]]) | ! Sputter deposition ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]]) | ||
! Thermal evaporation ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]]) | ! Thermal evaporation ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]]) | ||
! Thermal evaporation ([[Specific Process Knowledge/Thin film deposition/thermalevaporator|Thermal Evaporator]]) | |||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
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Aluminum deposition onto unexposed e-beam resist | Aluminum deposition onto unexposed e-beam resist | ||
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Aluminum deposition onto unexposed e-beam resist | |||
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|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
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|RF Ar clean | |RF Ar clean | ||
|RF Ar clean | |RF Ar clean | ||
|None | |||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
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|10Å to ~0.5µm (very time consuming ) | |10Å to ~0.5µm (very time consuming ) | ||
|10Å to 0.5 µm (this uses all Al in the boat) | |10Å to 0.5 µm (this uses all Al in the boat) | ||
|10Å to 0.5 µm | |||
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|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
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|Depending on [[/Sputter rates for Al|process parameters]], up to ~2.5 Å/s | |Depending on [[/Sputter rates for Al|process parameters]], up to ~2.5 Å/s | ||
|~1.5Å/s to 2Å/s | |~1.5Å/s to 2Å/s | ||
|~0.5Å/s to 2Å/s | |||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
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*6x4" wafers or | *6x4" wafers or | ||
*6x6" wafers | *6x6" wafers | ||
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*Up to one 8" wafer | |||
|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
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* Pyrex wafers | * Pyrex wafers | ||
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* Silicon wafers | |||
* Quartz wafers | |||
* Pyrex wafers | |||
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* Silicon wafers | * Silicon wafers | ||
* Quartz wafers | * Quartz wafers | ||
* Pyrex wafers | * Pyrex wafers | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
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* Silicon oxide | |||
* Silicon (oxy)nitride | |||
* Photoresist | |||
* PMMA | |||
* Mylar | |||
* SU-8 | |||
* Metals | |||
| | | | ||
* Silicon oxide | * Silicon oxide | ||
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|Thickness above 200 nm: ask for permission | |Thickness above 200 nm: ask for permission | ||
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| | |Thickness above 200 nm: ask for permission | ||
|Thickness above 200 nm: ask for permission | |||
|} | |} | ||