Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions

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 |-style="background:silver; color:black"
 !
-! 7-up wafers
+! Wafer Cleaning
-! 7-up Masks
+! Mask Cleaning
-! Piranha
+! Piranha (fume hood)
 |-
 |-style="background:WhiteSmoke; color:black"
 |'''General description'''
 |
-Cleaning of wafers using the dedicated tank in cleanroom D3.
+Cleaning of wafers using the dedicated bath in Wet bench 03.
 |
-Cleaning of masks using the dedicated tank in cleanroom D3.
+Cleaning of masks using the dedicated bath in Wet bench 03.
 |
-Cleaning of wafers using a beaker in the fumehood in cleanroom B1. Used for glass wafers or wafers with metal or other materials that you are not allowed to put in the 7-up for wafers or masks.
+Cleaning of wafers using a beaker in a fumehood in cleanroom B1 or D3. Used for glass wafers or wafers with metal or other materials that you are not allowed to put in the Wafer or Mask Cleaning bath.
 |-
 |-style="background:LightGrey; color:black"
 |'''Chemical solution'''
-|Sulfuric acid (98%) and Ammonium persulfate
+|Sulfuric acid (98%) and ammonium persulfate
-|Sulfuric acid (98%) and Ammonium persulfate
+|Sulfuric acid (98%) and ammonium persulfate
-|Sulfuric acid (98%) and Hydrogen peroxide (30%) in the ratio 4:1. First add H<sub>2</sub>SO<sub>4</sub> into a glass beaker then add H<sub>2</sub>O<sub>2</sub><sup>{{fn|1}}</sup>.
+|Sulfuric acid (98%) and hydrogen peroxide (30%) in the ratio 4:1. First add H<sub>2</sub>SO<sub>4</sub> into a glass beaker then add H<sub>2</sub>O<sub>2</sub><sup>{{fn|1}}</sup>.
 |-
 |-style="background:WhiteSmoke; color:black"
 |'''Process temperature'''
-|80 <sup>o</sup>C
+|80°C
-|80 <sup>o</sup>C
+|80°C
-|~70 <sup>o</sup>C the chemicals will heat up to working temperature during mixing, '''therefore be careful!''' First add H<sub>2</sub>SO<sub>4</sub> into a glass beaker then add H<sub>2</sub>O<sub>2</sub><sup>{{fn|1}}</sup>.
+|~70-80°C. The chemicals will heat up to working temperature during mixing, '''therefore be careful!'''<sup>{{fn|1}}</sup>.
 |-
 |-style="background:LightGrey; color:black"
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 *Wafers with Cr
 |
-All materials (in beaker).
+All materials allowed in cleanroom (in beaker).
 |-
 |-style="background:LightGrey; color:black"