Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using RIE1 or RIE2/Images of 1SIO2mbr with burned resist mask: Difference between revisions
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===Etch of SiO2 using the recipe 1SIO2mbr with burned resist as masking material | ===Etch of SiO2 using the recipe 1SIO2mbr with burned resist as masking material === | ||
''Berit Geilman Herstrøm (BGE) from Danchip@DTU'' | |||
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Revision as of 08:36, 29 June 2017
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Etch of SiO2 using the recipe 1SIO2mbr with burned resist as masking material
Berit Geilman Herstrøm (BGE) from Danchip@DTU