Specific Process Knowledge/Thin film deposition/Deposition of AZO: Difference between revisions
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Revision as of 10:10, 7 April 2017
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AZO can be deposited by Sputtering process and atomic layer deposition (ALD). In the chart below you can compare the different deposition equipment.
Sputtering deposition (Lesker) | Atomic layer deposition (ALD Picosun R200) | |
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General description | Sputter deposition of AZO | Atomic layer deposition of AZO |
Pre-clean | RF Ar clean | |
Layer thickness | 10Å to 5000Å* | 0 to 1000 Å |
Deposition rate | Depending on process parameters. | Depending on temperature |
Batch size |
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Allowed materials |
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Comment |
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* For thicknesses above 200 nm permission is required.