Specific Process Knowledge/Thin film deposition/ALD Picosun R200/AZO deposition using ALD: Difference between revisions
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!# macrocycles | !# macrocycles | ||
|colspan="8" align="center"| | |colspan="8" align="center"|<i>n</i> | ||
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!# cycles | !# cycles | ||
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DEZ pulse time: (0.1 + 0.1) s * 20 = 4 s | DEZ pulse time: (0.1 + 0.1) s * 20 = 4 s | ||
TMA pulse time: (0.1 + 0.1 )s * 1 = 0.2 s | TMA pulse time: (0.1 + 0.1 )s * 1 = 0.2 s | ||
H<sub>2</sub>O pulse time: [(0.1 + 0.1) s * 20] + [ (0.1 + 0.1) s * 1] 4.2 s | |||
H<sub>2</sub>O pulse time: [(0.1 + 0.1) s * 20] + [(0.1 + 0.1) s * 1] = 4.2 s | |||
The number of cycles for each precursor now equals the number of macrocycles (<i>n</i>). |
Revision as of 17:34, 9 January 2017
THIS PAGE IS UNDER CONSTRUCTION![Under construction.png](/images/thumb/f/f8/Under_construction.png/200px-Under_construction.png.jpeg)
EtZn2O = DEZ
Recipe: AZO 20T
Maximum deposition thickness: xx nm
Temperature: x oC - xx oC
# macrocycles | n | |||||||
---|---|---|---|---|---|---|---|---|
# cycles | 20 | 1 | ||||||
Precursor | DEZ | DEZ | H2O | H2O | TMA | TMA | H2O | H2O |
Nitrogen flow | 200 sccm | 200 sccm | 150 sccm | 150 sccm | 200 sccm | 200 sccm | ||
Pulse time | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s | 0.1 s |
Purge time | 0.5 s | 20.0 s | 0.5 s | 20.0 s | 0.5 s | 20.0 s | 0.5 s | 20.0 s |
How to fill out the process log in LabManager:
The pulse time for each precursor equals the total pulse time times the number of cycles in each macroscycle.
DEZ pulse time: (0.1 + 0.1) s * 20 = 4 s
TMA pulse time: (0.1 + 0.1 )s * 1 = 0.2 s
H2O pulse time: [(0.1 + 0.1) s * 20] + [(0.1 + 0.1) s * 1] = 4.2 s
The number of cycles for each precursor now equals the number of macrocycles (n).