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Specific Process Knowledge/Thin film deposition/Deposition of Nickel: Difference between revisions

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! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Alcatel|Alcatel]])
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Alcatel|Alcatel]])
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]])
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]])
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Multisource PVD|PVD co-sputter/evaporation]])
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Physimeca|Physimeca]])
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Physimeca|Physimeca]])
! Sputter deposition ([[Specific Process Knowledge/Thin film deposition/Lesker|Lesker]])
! Sputter deposition ([[Specific Process Knowledge/Thin film deposition/Lesker|Lesker]])
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! General description
! General description
|E-beam deposition of Nickel
|E-beam deposition of Nickel
|E-beam deposition of Nickel
|E-beam deposition of Nickel
|E-beam deposition of Nickel
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|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
! Pre-clean
! Pre-clean
|RF Ar clean
|RF Ar clean
|RF Ar clean
|RF Ar clean
|RF Ar clean
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|10Å to 5000 Å*
|10Å to 5000 Å*
|10Å to 1 µm*
|10Å to 1 µm*
|10Å to 1000 Å
|10Å to 2000 Å
|10Å to 2000 Å
|10Å to 2000 Å
|10Å to 2000 Å
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|2Å/s to 15Å/s
|2Å/s to 15Å/s
|10Å/s to 15Å/s
|10Å/s to 15Å/s
|About 1Å/s
|1 to 10Å/s
|1 to 10Å/s
|Depends on process parameters. About 1 Å/s  
|Depends on process parameters. About 1 Å/s  
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*6x4" wafers or
*6x4" wafers or
*6x6" wafers
*6x6" wafers
|
*12x2" wafers or
*12x4" wafers or
*4x6" wafers
|
|
*1x 2" wafer or
*1x 2" wafer or
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* Mylar  
* Mylar  
* SU-8  
* SU-8  
|
* Silicon oxide
* Silicon (oxy)nitride
* Photoresist
* PMMA
* Mylar
* SU-8
* Metals
|
|
* Silicon
* Silicon
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*[[/Stress Wordentec Ni films|Stress in Wordentec Ni films: study here]].  
*[[/Stress Wordentec Ni films|Stress in Wordentec Ni films: study here]].  
*Thicknesses above 2000 Å  requires special permission
*Thicknesses above 2000 Å  requires special permission
|Only very thin layers (up to 100nm).
|
|
|
|
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