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Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic: Difference between revisions

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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,569 edits
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,569 edits
Line 28: Line 28:
! width="40" | Coil  
! width="40" | Coil  
! width="40" | Platen
! width="40" | Platen
! width="40" | Runs
! width="40" | SEM images
! width="40" | Keywords
! width="40" | Keywords
|-
|-
Line 49: Line 49:
| 400            <!--Coil power  -->
| 400            <!--Coil power  -->
| 3          <!--Platen power  -->
| 3          <!--Platen power  -->
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic/isoslow1|1 ]]      <!-- link processes -->
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic/isoslow1|Click ]]      <!-- link processes -->
| NA          <!--Keywords  -->
| NA          <!--Keywords  -->
|-
|-
|}
|}
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