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Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
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|-  
|-  
|250  
|250  
|19.58
|24.83
|2.23
|1.22
|0.35
|0.16
|1.66
|1.61


|-  
|-  
|500  
|500  
|37.94
|45.48
|2.09
|1.35
|0.60
|0.41
|1.65
|1.63


|-  
|-  
|750  
|750  
|56.52
|68.03
|1.85
|1.42
|0.81
|0.59
|1.65
|1.63


|-  
|-  
|1000  
|1000  
|75.91
|90.66
|1.49
|1.74
|0.59
|0.94
|1.65
|1.63


|-
|-
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|}
|}


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==Low temperature deposition of TiO<sub>2</sub>==
==Low temperature deposition of TiO<sub>2</sub>==
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/ALD_multilayers"