Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch)/Silicon Nitride Etch using AOE/Nitride etch with DUV mask: Difference between revisions

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===Silicon nitride etch with the standard silicon oxide etch===
==Silicon nitride etch with the standard silicon oxide etch==


<gallery caption="Etch of LPCVD nitride with DUV KRF resist as mask. The mask is still on. Made by BGHE February 2015 " widths="300px" heights="250px" perrow="3">
<gallery caption="Etch of LPCVD nitride with DUV KRF resist as mask. The mask is still on. Made by BGHE February 2015 " widths="300px" heights="250px" perrow="3">

Revision as of 16:04, 15 March 2016

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Silicon nitride etch with the standard silicon oxide etch

  • Etch of LPCVD nitride with DUV KRF resist as mask. The mask is still on. Made by BGHE February 2015
  • Profile of lines with 1µm pitch
    Profile of lines with 1µm pitch
  • Profile of lines with 4µm pitch
    Profile of lines with 4µm pitch
  • Profile of 2µm line - zoom in on 4µm pitch
    Profile of 2µm line - zoom in on 4µm pitch
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